Electron beam sensitive resist

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Electron beam imaging

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430283, G03C 500

Patent

active

044488769

ABSTRACT:
This invention describes an ionizing radiation sensitive material having high contrast, high sensitivity and comprised of a mixed half-ester or half amide of the reaction of an N-hydroxy or N-aminoalkyl amide and a hydroxy alkyl terminally unsaturated compound with an alkylvinyl ether-maleic anhydride copolymer. A typical material is made by reacting hydroxyethyl pyrrolidone and hydroxyethyl acrylate with octadecylvinyl ether-maleic anhydride copolymer.

REFERENCES:
patent: 3475515 (1969-10-01), Blatz et al.
patent: 3703402 (1972-11-01), Cole
patent: 3857822 (1974-12-01), Frass
patent: 4001016 (1977-01-01), Rosenkranz et al.

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