Electron beam sensitive resist

Details Electron beam sensitive resist Electron beam sensitive resist

1984-04-05

1985-09-17

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Electron beam imaging

430270, 430326, 20415915, 20415916, 525256, 525259, 525285, G03C 505

Patent

active

045420904

ABSTRACT:
This invention describes an improved ionizing radiation sensitive material having high contrast, high sensitivity and comprised of a metal complex of a mixed half-ester or half amide product of the reaction of an N-hydroxy or N-aminoalkyl amide and a hydroxy alkyl terminally unsaturated compound with an alkylvinyl ether-maleic anhydride copolymer. A typical material is made by reacting a metal salt with the mixed half-ester or half-amide product of the reaction of an N-hydroxy or N-amino alkyl amide and a hydroxy alkyl terminally unsaturated compound with an alkyl vinyl ether-maleic anhydride copolymer.

REFERENCES:
patent: 3703402 (1972-11-01), Cole
patent: 4375398 (1983-03-01), Lorenz et al.

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