Electron beam pattern generator with photocathode comprising...

Details Electron beam pattern generator with photocathode comprising... Electron beam pattern generator with photocathode comprising...

2007-01-09

2007-01-09

Berman, Jack I. (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C313S542000

Reexamination Certificate

active

10282324

ABSTRACT:
An electron beam pattern generator comprises a laser beam generator to generate a laser beam. A photocathode receives the laser beam and generates one or more electron beams. The photocathode comprises cesium halide material, such as for example, cesium bromide or iodide. The cesium halide material may have a decreased workfunction that allows efficient operation at a wavelength of the laser beam of at least about 200 nm. Electron optics are provided to focus the electron beams onto a substrate that is supported on a substrate support.

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R.K. Martin, J.H. Chappell and S.S. Murray, “Relative Quantum Efficiency Measurement of CsI, CsBr and CsI/CsBr Coated Micro Channel Plates,” Smithsonian Center for Astrophysics, Cambridge, MA 02138.

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