Electron beam metrology system

Details Electron beam metrology system Electron beam metrology system

1986-09-26

1988-08-30

Anderson, Bruce C.

Radiant energy

Inspection of solids or liquids by charged particles

Electron probe type

250397, H01J 3722, H01J 3728

Patent

active

047679263

ABSTRACT:
Disclosed is an electron beam metrology system for measuring the width of a pattern on a specimen by scanning the specimen with a deflected electron beam, detecting a pattern image signal provided by secondary electrons emitted from the specimen, and measuring the pattern width on the specimen on the basis of the pattern detection signal. The system comprises a signal detecting device including at least one set of two detectors disposed toward the scanning direction of the electron beam in a relation symmetrical with respect to the optical axis of the electron beam for detecting pattern image signals independently of each other, a device for recognizing surface topography of the pattern using an output signal of the signal detecting device, and a device for measuring the pattern width while discriminating as to whether the pattern is a raised-profile pattern or a hollow-profile pattern.

REFERENCES:
patent: 3329813 (1967-07-01), Hashimoto
patent: 4567364 (1986-01-01), Kuno et al.
patent: 4600839 (1986-07-01), Ichihashi et al.

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