Electron beam metrology system

Details Electron beam metrology system Electron beam metrology system

1987-02-11

1988-06-14

Anderson, Bruce C.

Radiant energy

Inspection of solids or liquids by charged particles

Electron probe type

250397, G01N 2300, H01D 314

Patent

active

047513845

ABSTRACT:
An electron beam metrology system for measuring the width of a pattern on a surface of a sample in such a manner that the surface of the sample is scanned with an electron beam, secondary electrons emitted from the surface are detected to obtain a detection signal, and the width of the pattern is measured by using the detection signal, is disclosed in which a pair of detectors are disposed symmetrically with respect to the optical axis of the electron beam in a scanning direction thereof, a ratio of one of the output signals of the detectors to the other output signal and a ratio of the other output signal to the one output signal are formed, and a sum signal indicative of the sum of two ratios is produced, to be used for measuring the width of the pattern correctly and accurately, without being affected by a change in pattern material.

REFERENCES:
patent: 3597607 (1971-08-01), Campbell
patent: 4588890 (1986-05-01), Fimmes
patent: 4600839 (1986-07-01), Ichihashi et al.
patent: 4670652 (1987-06-01), Ichihashi et al.

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