Electron beam lithography method, patterned master carrier...

Details Electron beam lithography method, patterned master carrier... Electron beam lithography method, patterned master carrier...

2007-06-12

2007-06-12

Young, Christopher G. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Electron beam imaging

C430S942000, C369S044130, C369S101000

Reexamination Certificate

active

11170141

ABSTRACT:
A fine pattern having first elements within track widths and second elements, which are shifted half a track pitch from the first elements, are drawn across the entire surface of a disk accurately and at high speed. A transfer pattern for a magnetic transfer master carrier is drawn by scanning an electron beam on a disk coated with resist. The first elements and the second elements, which are shifted half a track pitch such that they straddle adjacent tracks, are drawn. While the disk is rotated unidirectionally, the electron beam is deflected in the radial direction within a single track of the disk to draw the first elements. Deflection of the electron beam in the radial direction is shifted half a track, to draw the second elements that straddle adjacent tracks at the same time.

REFERENCES:
patent: 6735163 (2004-05-01), Marshall
patent: 6930961 (2005-08-01), Wada
patent: 6930971 (2005-08-01), Marshall
patent: 7026098 (2006-04-01), Komatsu et al.
patent: 2002/0186632 (2002-12-01), Kumasaka et al.
patent: 2004/0057158 (2004-03-01), Usa et al.
patent: 2004/0240366 (2004-12-01), Tomita
patent: 1-267-340 (2002-12-01), None
patent: 10-40544 (1998-02-01), None
patent: 10-269566 (1998-10-01), None
patent: 2000-207738 (2000-07-01), None
patent: 2001-110050 (2001-04-01), None
patent: 2001-256644 (2001-09-01), None

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