Electron beam lithography method

Details Electron beam lithography method Electron beam lithography method

2006-10-31

2006-10-31

Young, Christopher G. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Electron beam imaging

C430S022000, C430S942000

Reexamination Certificate

active

07129024

ABSTRACT:
An electron beam lithography method includes extending the widths of a plurality of stripes which divide a region where an electron beam exposure is to be performed, so that the boundaries of the stripes overlap adjacent stripes at each boundary, and sequentially exposing each of the stripes to an electron beam.

REFERENCES:
patent: 5894057 (1999-04-01), Yamaguchi et al.
patent: 6162581 (2000-12-01), Nakasuji et al.
patent: 6258511 (2001-07-01), Okino

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