Electron beam lithography method

Details Electron beam lithography method Electron beam lithography method

2006-04-11

2006-04-11

Young, Christopher G. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Electron beam imaging

C430S942000, C360S135000

Reexamination Certificate

active

07026098

ABSTRACT:
An electron beam lithography method for performing lithography of elements included in a pattern by scanning a disk having resist coated thereon, placed on a rotating stage which is movable in a radial direction of the disk, with an electron beam while rotating the rotating stage. The electron beam has a beam diameter smaller than a minimum width of an element shape. The electron beam is reciprocally oscillated in a circumferential direction X approximately orthogonal to a radial direction Y of the disk and deflected in the radial direction Y, thereby filling in the element shape. Lithography of the elements is sequentially performed by rotating the disk unidirectionally, and thus a desired micropattern is drawn in the entire region of the disk. A lithographic length L of the element in the circumferential direction X may be defined by amplitude of the reciprocal oscillation of the electron beam.

REFERENCES:
patent: 6423968 (2002-07-01), Panzer et al.
patent: 6784442 (2004-08-01), Muraki et al.
patent: 2001/0028964 (2001-10-01), Nagao et al.
patent: 2002/0172130 (2002-11-01), Wada
patent: 2004/0057158 (2004-03-01), Usa et al.
patent: 2004/0240366 (2004-12-01), Tomita
patent: 1152417 (2001-11-01), None
patent: 1187121 (2002-03-01), None
patent: 2000207738 (2000-07-01), None
patent: 2001-110050 (2001-04-01), None
patent: 2001202663 (2001-07-01), None
patent: 2002050084 (2002-02-01), None
patent: 2002298447 (2002-10-01), None

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