Electron beam lithography

Details Electron beam lithography Electron beam lithography

1994-04-15

1995-04-25

Baxter, Janet C.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Electron beam imaging

430273, 430911, 430909, 430942, 2504923, G03F 700

Patent

active

054098017

ABSTRACT:
A method for improving the resolution of an electron resist pattern on a substrate coated with a polymeric electron resist film is disclosed which provides an external coating layer of dried polymer selected from the group consisting of water-soluble polymers and poly(m-phenylene isophthalamide), or of a mixture consisting essentially of said dried polymer and hexavalent tungsten compounds wherein the weight ratio of the tungsten compounds to polymer is up to about 1:1. Also disclosed are substrates coated with a polymeric resist film wherein the resist film consists essentially of such external layers, or wherein an external coating layer of said polymer-tungsten compound mixture is provided.

REFERENCES:
patent: 5139922 (1992-08-01), Watanabe et al.

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