Electron beam exposure mask and method of manufacturing the same

Details Electron beam exposure mask and method of manufacturing the same Electron beam exposure mask and method of manufacturing the same

1998-06-01

2000-07-18

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Electron beam imaging

G03F 900, G03C 500

Patent

active

060905271

ABSTRACT:
In an exposure mask of the present invention, a plurality of opening regions are disposed via crossbeams, each having a size not to be resolved, along peripheral edges of island-like patterns and peninsula-like patterns for shielding transmission of charged particles.

REFERENCES:
patent: 4426584 (1984-01-01), Bohlen et al.
patent: 4735881 (1988-04-01), Kobayashi et al.
patent: 5008553 (1991-04-01), Abe
patent: 5148033 (1992-09-01), Yamada et al.
patent: 5424173 (1995-06-01), Wakabayashi et al.
T.H.P. Chang, "Proximity Effect in Electron-Beam Lithography", J. Vac. Sci. Technol., vol. 12, No. 6, Nov./Dec. 1975, pp 1271-1275.

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