Electron beam excited ion irradiation apparatus

Details Electron beam excited ion irradiation apparatus Electron beam excited ion irradiation apparatus

1992-09-25

1994-07-05

Anderson, Bruce C.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250427, 31511181, H01J 3730

Patent

active

053269810

ABSTRACT:
In an electron beam excited ion irradiation apparatus which irradiates ions to a material, an electrical discharge changes an inert gas into a plasma. Electrons are drawn from this plasma and are made into electron beams. The electron beams are passed through an active gas to create ion. When the ion is irradiated to a material, electron components of the electron beams, which are irradiated vertically to a surface of the material are changed their irradiation direction. Control of the range of electron beam irradiation is performed by a magnetic filed formed so as to surround the ion beams.

REFERENCES:
patent: 4559477 (1985-12-01), Leung et al.
patent: 4749910 (1988-06-01), Hara et al.
patent: 4749912 (1988-06-01), Hara et al.
patent: 4782235 (1988-11-01), Lejeune et al.
patent: 5028791 (1991-07-01), Koshiishi et al.
patent: 5072125 (1991-12-01), Nakanishi et al.

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