Electron beam duplication lithography method and apparatus

Details Electron beam duplication lithography method and apparatus Electron beam duplication lithography method and apparatus

2006-03-14

2006-03-14

Young, Christopher G. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Electron beam imaging

C430S942000, C250S492200, C250S492220, C250S492300

Reexamination Certificate

active

07011927

ABSTRACT:
An electron beam duplication lithography apparatus and method for focusing electrons emitted from a mask plate as a result of an application of an electric field between a mask plate and a duplication plate. Irradiation of electrons from the mask plate is assisted through an electric field lens or magnetic field lens, or a combination thereof from an electron field emission material formed into a pattern on a flat surface of a substrate. The result is that a congruent or similar pattern is lithographed by electron beam exposure onto an electron beam resist film from a field emission film having the congruent or similar pattern to be created.

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