Electron beam apparatus and method of manufacturing...

Radiant energy – Inspection of solids or liquids by charged particles

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C250S307000, C250S310000, C250S400000, C250S442110, C250S3960ML, C250S397000, C250S492200, C250S492300

Reexamination Certificate

active

10445826

ABSTRACT:
The present invention provides an electron beam apparatus for evaluating a sample surface, which has a primary electro-optical system for irradiating a sample with a primary electron beam, a detecting system, and a secondary electro-optical system for directing secondary electron beams emitted from the sample surface by the irradiation of the primary electron beam to the detecting system.

REFERENCES:
patent: 4726689 (1988-02-01), Pollock
patent: 4912052 (1990-03-01), Miyoshi et al.
patent: 4944645 (1990-07-01), Suzuki
patent: 4954705 (1990-09-01), Brunner et al.
patent: 5359197 (1994-10-01), Komatsu et al.
patent: 5557105 (1996-09-01), Honjo et al.
patent: 5892224 (1999-04-01), Nakasuji
patent: 5981947 (1999-11-01), Nakasuji et al.
patent: 6038018 (2000-03-01), Yamazaki et al.
patent: 6087667 (2000-07-01), Nakasuji et al.
patent: 6104035 (2000-08-01), Muraki
patent: 6125522 (2000-10-01), Nakasuji
patent: 6184526 (2001-02-01), Kohama et al.
patent: 6265719 (2001-07-01), Yamazaki et al.
patent: 6344750 (2002-02-01), Lo et al.
patent: 6476390 (2002-11-01), Murakoshi et al.
patent: 6479819 (2002-11-01), Hamashima et al.
patent: 6583413 (2003-06-01), Shinada et al.
patent: 6583634 (2003-06-01), Nozoe et al.
patent: 6593152 (2003-07-01), Nakasuji et al.
patent: 6797954 (2004-09-01), Shinada et al.
patent: 2002/0015143 (2002-02-01), Yin et al.
patent: 2003/0209676 (2003-11-01), Loschner et al.
patent: 0 999 572 (2000-05-01), None
patent: 62-100936 (1987-05-01), None
patent: 9-73872 (1997-03-01), None
patent: 10-12684 (1998-01-01), None
patent: 10-73424 (1998-03-01), None
patent: 2000-3692 (2000-01-01), None
patent: 2000-100369 (2000-04-01), None
patent: 2000-113848 (2000-04-01), None
patent: 2000-133565 (2000-05-01), None
U.S. Appl. No. 09/985,323, filed Nov. 2, 2001, Mamoru Nakasuji et al., “Electron Beam Apparatus and device Production Method Using the Electron Beam Apparatus”.
U.S. Appl. No. 09/985,324, filed Nov. 2, 2001, Toshifumi Kimba et al., “Apparatus for Inspecting Material with Electron Beam, Method for Operating Same and Method for Manufacturing Semiconductor Device Using Former”.
U.S. Appl. No. 09/985,322, filed Nov. 2, 2001, Mamoru Nakasuji et al., “Electron Beam Apparatus and Method of Manufacturing Semiconductor Device Using the Apparatus”.
U.S. Appl. No. 09/985,331, filed Nov. 2, 2001, Mamoru Nakasuji et al., “Method for Inspecting Substrate, Substrate Inspecting System and Electron Beam Apparatus”.
Electron Ion Beam Handbook, pp. 115-119 (1988) with partial translation.
B. Lischke et al., “Multi-Beam Concepts for Nanometer Devices,”Japanese Journal of Applied Physics, vol. 28. No. 10, 1989, pp. 2058-2064.
P. Sandland et al., “An Electron-Bean Inspection System for X-ray Mask Production.”Journal of Vacuum Science&Technology B, vol. 9. No. 6. 1991. pp. 3005-3009.
W.D. Meisburger et al., “Requirements and Performance of an Electron Beam Column Designed for X-ray Mask Inspection,”Journal of Vacuum Science&Technology B, vol. 9. No. 6. 1991. pp. 3010-3014.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Electron beam apparatus and method of manufacturing... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Electron beam apparatus and method of manufacturing..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electron beam apparatus and method of manufacturing... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3739353

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.