Radiant energy – Inspection of solids or liquids by charged particles – Electron probe type
Reexamination Certificate
2005-03-08
2005-03-08
Font, Frank G. (Department: 2883)
Radiant energy
Inspection of solids or liquids by charged particles
Electron probe type
30
Reexamination Certificate
active
06864482
ABSTRACT:
An electron beam (4) to be irradiated onto a sample (10) is two-dimensionally scanned by a scanning coil (9), and secondary electrons generated from the sample (10) by the scanning are detected by a secondary electron detector (13). A deflection coil (15) for image shifting is used for electrically deflecting the primary electron beam to shift a field of view for image shift in an arbitrary direction by an arbitrary amount. By the image shift, the primary electron beam (4) to be irradiated onto the sample is energy dispersed to degrade the resolution. However, an E×B field producer (30) for dispersion control gives the primary electron beam energy dispersion in the opposite direction and having the equal magnitude. Therefore, the energy dispersion produced in the primary electron beam by the image shift is automatically corrected.
REFERENCES:
patent: 4352985 (1982-10-01), Martin
patent: 4362945 (1982-12-01), Riecke
patent: 4978855 (1990-12-01), Liebi et al.
patent: 5221844 (1993-06-01), Van der Mast et al.
patent: 5300775 (1994-04-01), Van der Mast
patent: 6084238 (2000-07-01), Todokoro et al.
patent: 6614026 (2003-09-01), Adamec
patent: 2-142045 (1990-05-01), None
patent: 2-242555 (1990-09-01), None
patent: 4-328232 (1992-11-01), None
patent: 6-132002 (1994-05-01), None
patent: 2821153 (1998-08-01), None
Sato Mitsugu
Todokoro Hideo
Dickstein , Shapiro, Morin & Oshinsky, LLP
Font Frank G.
Hitachi , Ltd.
Kalivoda Christopher M.
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