Electron beam apparatus

Details Electron beam apparatus Electron beam apparatus

2005-09-27

2005-09-27

Lee, John R. (Department: 2881)

Radiant energy

Inspection of solids or liquids by charged particles

Electron microscope type

C250S310000, C250S3960ML

Reexamination Certificate

active

06949745

ABSTRACT:
An electron beam apparatus has an optical axis, an electron beam source for generating an electron beam directed along the optical axis, and a magnetic field lens having an axis coincident with the optical axis for focusing the electron beam onto a sample which is subjected to a negative voltage so that secondary electrons are emitted from the sample. The magnetic field lens has a conductive cylinder surrounding a part of the optical axis to permit the passage therethrough of an electron beam from the electron beam source. A first detector detects secondary electrons emitted by the sample in a direction away from the optical axis and is disposed at a position generally confronting the conductive cylinder. A second detector is disposed over the conductive cylinder. A Wien filter deflector deflects secondary electrons emitted by the sample toward and for detection by the second detector. The Wien filter deflector is disposed on the optical axis and between the conductive cylinder and the second detector.

REFERENCES:
patent: 4426577 (1984-01-01), Koike et al.
patent: 4437009 (1984-03-01), Yamazaki
patent: 4808821 (1989-02-01), Feuerbaum et al.
patent: 4818874 (1989-04-01), Ishikawa
patent: 4893009 (1990-01-01), Kuroda
patent: 4922097 (1990-05-01), Todokoro et al.
patent: 5300880 (1994-04-01), Okubo et al.
patent: 5412210 (1995-05-01), Todokoro et al.
patent: 5608218 (1997-03-01), Sato et al.
patent: 5731580 (1998-03-01), Sato et al.
patent: 5872358 (1999-02-01), Todokoro et al.
patent: 5894124 (1999-04-01), Iwabuchi et al.
patent: 5939720 (1999-08-01), Todokoro
patent: 5981947 (1999-11-01), Nakasuji et al.
patent: 6037589 (2000-03-01), Yonezawa et al.
patent: 6043491 (2000-03-01), Ose et al.
patent: 6172363 (2001-01-01), Shinada et al.
patent: 6555819 (2003-04-01), Suzuki et al.
patent: 6580074 (2003-06-01), Sato et al.
patent: 6600156 (2003-07-01), Kazumori
patent: 6646262 (2003-11-01), Todokoro et al.

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