Electrolysis: processes – compositions used therein – and methods – Electrolytic erosion of a workpiece for shape or surface... – With programmed – cyclic – or time responsive control
Reexamination Certificate
2005-05-31
2005-05-31
Ryan, Patrick (Department: 1745)
Electrolysis: processes, compositions used therein, and methods
Electrolytic erosion of a workpiece for shape or surface...
With programmed, cyclic, or time responsive control
C205S668000, C205S674000
Reexamination Certificate
active
06899804
ABSTRACT:
An electrolyte composition and method for planarizing a surface of a wafer using the electrolyte composition is provided. In one aspect, the electrolyte composition includes ammonium dihydrogen phosphate, diammonium hydrogen phosphate, or a mixture thereof. The composition has a pH between about 3 and about 10 which is environmentally friendly and does not present hazardous operation concerns. The composition may further comprise one or more additives selected from a group consisting of benzotriazole, ammonium citrate, ethlylenediamine, tetraethylenepentamine, triethylenetetramine, diethylenetriamine, amino acids, ammonium oxalate, ammonia, ammonium succinate, and citric acid.
REFERENCES:
patent: 2582020 (1952-01-01), Emery
patent: 3239441 (1966-03-01), Marosi
patent: 3873512 (1975-03-01), Latanision
patent: 4263113 (1981-04-01), Bernard
patent: 4663005 (1987-05-01), Edson
patent: 4666683 (1987-05-01), Brown et al.
patent: 4793895 (1988-12-01), Kaanta et al.
patent: 4934102 (1990-06-01), Leach et al.
patent: 4992135 (1991-02-01), Doan
patent: 5002645 (1991-03-01), Eastland, Jr. et al.
patent: 5096550 (1992-03-01), Mayer et al.
patent: 5114548 (1992-05-01), Rhoades
patent: 5129981 (1992-07-01), Wang et al.
patent: 5209816 (1993-05-01), Yu et al.
patent: 5217586 (1993-06-01), Datta et al.
patent: 5225034 (1993-07-01), Yu et al.
patent: 5256565 (1993-10-01), Bernhardt et al.
patent: 5340370 (1994-08-01), Cadien et al.
patent: 5391258 (1995-02-01), Brancaleoni et al.
patent: 5407526 (1995-04-01), Danielson et al.
patent: 5534106 (1996-07-01), Cote et al.
patent: 5543032 (1996-08-01), Datta et al.
patent: 5567300 (1996-10-01), Datta et al.
patent: 5575706 (1996-11-01), Tsai et al.
patent: 5770095 (1998-06-01), Sasaki et al.
patent: 5783489 (1998-07-01), Kaufman et al.
patent: 5800577 (1998-09-01), Kido
patent: 5807165 (1998-09-01), Uzoh et al.
patent: 5846882 (1998-12-01), Birang
patent: 5866031 (1999-02-01), Carpio et al.
patent: 5880003 (1999-03-01), Hayashi
patent: 5897375 (1999-04-01), Watts et al.
patent: 5911619 (1999-06-01), Uzoh et al.
patent: 5954997 (1999-09-01), Kaufman et al.
patent: 5965036 (1999-10-01), Maki et al.
patent: 6001730 (1999-12-01), Farkas et al.
patent: 6004880 (1999-12-01), Liu et al.
patent: 6056864 (2000-05-01), Cheung
patent: 6063306 (2000-05-01), Kaufman et al.
patent: 6066030 (2000-05-01), Uzoh
patent: 6068879 (2000-05-01), Pasch
patent: 6077412 (2000-06-01), Ting et al.
patent: 6083840 (2000-07-01), Mravic et al.
patent: 6090239 (2000-07-01), Liu et al.
patent: 6096652 (2000-08-01), Watts et al.
patent: 6099604 (2000-08-01), Sandhu et al.
patent: 6103096 (2000-08-01), Datta et al.
patent: 6106728 (2000-08-01), Iida et al.
patent: 6117775 (2000-09-01), Kondo et al.
patent: 6117783 (2000-09-01), Small et al.
patent: 6117853 (2000-09-01), Sakai et al.
patent: 6121152 (2000-09-01), Adams et al.
patent: 6126853 (2000-10-01), Kaufman et al.
patent: 6139763 (2000-10-01), Ina et al.
patent: 6143155 (2000-11-01), Adams et al.
patent: 6143656 (2000-11-01), Yang et al.
patent: 6153043 (2000-11-01), Edelstein et al.
patent: 6171352 (2001-01-01), Lee et al.
patent: 6176992 (2001-01-01), Talieh
patent: 6177026 (2001-01-01), Wang et al.
patent: 6190237 (2001-02-01), Huynh et al.
patent: 6194317 (2001-02-01), Kaisaki et al.
patent: 6206756 (2001-03-01), Chopra et al.
patent: 6217416 (2001-04-01), Kaufman et al.
patent: 6218305 (2001-04-01), Hosali et al.
patent: 6234870 (2001-05-01), Uzoh et al.
patent: 6238592 (2001-05-01), Hardy et al.
patent: 6248222 (2001-06-01), Wang
patent: 6258711 (2001-07-01), Laursen
patent: 6258721 (2001-07-01), Li et al.
patent: 6273786 (2001-08-01), Chopra et al.
patent: 6276996 (2001-08-01), Chopra
patent: 6280598 (2001-08-01), Barton et al.
patent: 6299741 (2001-10-01), Sun et al.
patent: 6303049 (2001-10-01), Lee et al.
patent: 6303551 (2001-10-01), Li et al.
patent: 6310019 (2001-10-01), Kakizawa et al.
patent: 6315803 (2001-11-01), Ina et al.
patent: 6315883 (2001-11-01), Mayer et al.
patent: 6348076 (2002-02-01), Canaperi et al.
patent: 6354916 (2002-03-01), Uzoh et al.
patent: 6355075 (2002-03-01), Ina et al.
patent: 6355153 (2002-03-01), Uzoh et al.
patent: 6375693 (2002-04-01), Cote et al.
patent: 6379223 (2002-04-01), Sun et al.
patent: 6391166 (2002-05-01), Wang
patent: 6395152 (2002-05-01), Wang
patent: 6416685 (2002-07-01), Zhang et al.
patent: 6419554 (2002-07-01), Chopra et al.
patent: 6428721 (2002-08-01), Ina et al.
patent: 6429133 (2002-08-01), Chopra
patent: 6440186 (2002-08-01), Sakai et al.
patent: 6440295 (2002-08-01), Wang
patent: 6447371 (2002-09-01), Brusic Kaufman et al.
patent: 6454819 (2002-09-01), Yano et al.
patent: 6455479 (2002-09-01), Sahbari
patent: 6508952 (2003-01-01), Lee et al.
patent: 6551935 (2003-04-01), Sinha et al.
patent: 6555158 (2003-04-01), Yoshio et al.
patent: 6562719 (2003-05-01), Kondo et al.
patent: 6565619 (2003-05-01), Asano et al.
patent: 6569349 (2003-05-01), Wang et al.
patent: 6579153 (2003-06-01), Uchikura et al.
patent: 6592742 (2003-07-01), Sun et al.
patent: 6593239 (2003-07-01), Kaufman et al.
patent: 6596638 (2003-07-01), Kondo et al.
patent: 6602112 (2003-08-01), Tran et al.
patent: 6605537 (2003-08-01), Bian et al.
patent: 6616976 (2003-09-01), Montano et al.
patent: 6620215 (2003-09-01), Li et al.
patent: 6653242 (2003-11-01), Sun et al.
patent: 6676484 (2004-01-01), Chopra
patent: 6679928 (2004-01-01), Costas et al.
patent: 6679929 (2004-01-01), Asano et al.
patent: 6693036 (2004-02-01), Nogami et al.
patent: 2001/0016469 (2001-08-01), Chopra
patent: 2001/0024878 (2001-09-01), Nakamura
patent: 2001/0036746 (2001-11-01), Sato et al.
patent: 2001/0042690 (2001-11-01), Talieh
patent: 2002/0008036 (2002-01-01), Wang
patent: 2002/0016064 (2002-02-01), Komai et al.
patent: 2002/0016073 (2002-02-01), Kondo et al.
patent: 2002/0016272 (2002-02-01), Kakizawa et al.
patent: 2002/0040100 (2002-04-01), Kume et al.
patent: 2002/0070126 (2002-06-01), Sato et al.
patent: 2002/0072309 (2002-06-01), Sato et al.
patent: 2002/0074230 (2002-06-01), Basol
patent: 2002/0088709 (2002-07-01), Hongo et al.
patent: 2002/0096659 (2002-07-01), Sakai et al.
patent: 2002/0108861 (2002-08-01), Emesh et al.
patent: 2002/0130049 (2002-09-01), Chen et al.
patent: 2002/0139055 (2002-10-01), Asano et al.
patent: 2002/0160698 (2002-10-01), Sato et al.
patent: 2003/0073385 (2003-04-01), Ma et al.
patent: 2003/0079416 (2003-05-01), Ma et al.
patent: 2003/0083214 (2003-05-01), Kakizawa et al.
patent: 2003/0104762 (2003-06-01), Sato et al.
patent: 2003/0113996 (2003-06-01), Nogami et al.
patent: 2003/0114004 (2003-06-01), Sato et al.
patent: 2003/0116445 (2003-06-01), Sun et al.
patent: 2003/0116446 (2003-06-01), Duboust et al.
patent: 2003/0136055 (2003-07-01), Li et al.
patent: 2003/0153184 (2003-08-01), Wang et al.
patent: 2003/0170091 (2003-09-01), Shomiar et al.
patent: 0 527 537 (1993-02-01), None
patent: 0 699 782 (1996-03-01), None
patent: 0 811 665 (1997-12-01), None
patent: 0 846 842 (1998-06-01), None
patent: 1 103 346 (2001-05-01), None
patent: 1 167 585 (2002-01-01), None
patent: 1 170 761 (2002-09-01), None
patent: P2001-77117 (2001-03-01), None
patent: 1 618 538 (1991-01-01), None
patent: 98/04646 (1998-02-01), None
patent: 98/49723 (1998-11-01), None
patent: WO 99 46353 (1999-09-01), None
patent: 99/53532 (1999-10-01), None
patent: 99/65072 (1999-12-01), None
patent: 00/26443 (2000-05-01), None
patent: 00 55876 (2000-09-01), None
patent: 01/77241 (2001-10-01), None
patent: WO 02 23616 (2002-03-01), None
patent: 02 075804 (2002-09-01), None
patent: WO 02 088229 (2002-11-01), None
patent: WO 03 060962 (2003-07-01), None
D. Landolt, “Fundamental Aspects of Electropolishing,” Mar. 18, 1996, pp. 1-11.
PCT Written Opinion for PCT/US02/04806, dated Mar. 9, 2004 (AMAT/5699.PC).
PCT Written Opinion for PCT/US03/06058, dated Feb. 13, 2004 (AMAT/5699-PC.02).
PCT International Preliminary Examination Report for PCT/US02/04806, dated Sep. 7, 2004. (AMAT/5699.PC).
PCT International Preliminary Examination Report for PCT/US03/06058, dated Sep. 7, 2004. (AMAT/5699.PC.02).
PCT International Sear
Chen Liang-Yuh
Duboust Alain
Liu Feng Q.
Neo Siew
Sun Lizhong
Applied Materials Inc.
Moser Patterson & Sheridan
Parsons Thomas H.
Ryan Patrick
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