Electrode, susceptor, plasma processing apparatus and method...

Coating apparatus – Gas or vapor deposition – With treating means

Reexamination Certificate

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C118S7230AN, C118S724000, C118S725000, C156S345430, C156S345450, C156S345470, C156S345520

Reexamination Certificate

active

07337745

ABSTRACT:
A susceptor24includes a heater38disposed in a planar state, upper and lower ceramic-metal composites40A and40B disposed so as to sandwich the heater38from above and from below, and a ceramic electrostatic chuck28for attracting and holding an object to be treated, W. The electrostatic chuck is joined to an upper surface of the upper ceramic-metal composite40A. The electrostatic chuck28has nearly the same coefficient of linear thermal expansion as that of the upper ceramic-metal composite40A. Thus, peeling or cracking of the electrostatic chuck28due to the difference in thermal expansion and contraction between the electrostatic chuck28and the upper ceramic-metal composite40A can be prevented.

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Computer Translation of Sagusa et al—http://www1.ipdl.jpo.go.jp/PA1/cgi-bin/PA1INDEX provided.
Introduction to Materials Science for Engineers, J.F. Shackelford; 3rd Ed. 1992, Macmillan Publishing Co. pp. 460-461.
http://www.matweb.com.

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