4. Coating apparatus
  5. Gas or vapor deposition
  6. With treating means

Shosuke Endo

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Electrode, susceptor, plasma processing apparatus and method...

Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate

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Gas diffusion plate for electrode of semiconductor wafer process

Equipment for production – distribution – or transformation of ene – Distribution – modification or control – Semiconductor – transistor or integrated circuit
Patent

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Plasma processing apparatus

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means
Patent

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Plasma treatment apparatus and method

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means
Patent

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Plasma treatment method and apparatus

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With workpiece support
Reexamination Certificate

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Profile ID: LFUS-PAI-P-307806

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