Electrochemical removal of tantalum-containing materials

Electrolysis: processes – compositions used therein – and methods – Electrolytic erosion of a workpiece for shape or surface...

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C205S705000

Reexamination Certificate

active

07964085

ABSTRACT:
A method of cleaning metal-containing deposits from a metal surface of a process chamber component includes immersing the metal surface in an electrochemical cleaning bath solution. A negative electrical bias is applied to the metal surface to electrochemically clean the metal-containing deposits from the metal surface. The cleaning method is capable of removing metal-containing deposits such as tantalum-containing deposits from the metal surface substantially without eroding the surface, and may be especially advantageous in the cleaning of components having textured surfaces.

REFERENCES:
patent: 2705500 (1955-04-01), Deer
patent: 3117833 (1964-01-01), Pierett
patent: 3457151 (1969-07-01), Kortejarvi
patent: 3522083 (1970-07-01), Woolman
patent: 3565771 (1971-02-01), Gulla
patent: 3679460 (1972-07-01), Reid
patent: 4100252 (1978-07-01), Pitts
patent: RE31198 (1983-04-01), Binns
patent: 4419201 (1983-12-01), Levinstein et al.
patent: 4491496 (1985-01-01), Laporte et al.
patent: 4673554 (1987-06-01), Niwa et al.
patent: 4713119 (1987-12-01), Earhart et al.
patent: 4717462 (1988-01-01), Homma et al.
patent: 4721792 (1988-01-01), Fujiyama
patent: 4756322 (1988-07-01), Lami
patent: 4959105 (1990-09-01), Neidiffer et al.
patent: 5009966 (1991-04-01), Garg et al.
patent: 5032469 (1991-07-01), Merz et al.
patent: 5064511 (1991-11-01), Gobbetti
patent: 5104501 (1992-04-01), Okabayashi
patent: 5164016 (1992-11-01), Henriet et al.
patent: 5180322 (1993-01-01), Yamamoto et al.
patent: 5180563 (1993-01-01), Lai et al.
patent: 5202008 (1993-04-01), Talieh
patent: 5215624 (1993-06-01), Dastolfo et al.
patent: 5248386 (1993-09-01), Dastolfo et al.
patent: 5338367 (1994-08-01), Henriet et al.
patent: 5366585 (1994-11-01), Robertson et al.
patent: 5391275 (1995-02-01), Mintz
patent: 5401319 (1995-03-01), Banholzer et al.
patent: 5474649 (1995-12-01), Kava et al.
patent: 5509558 (1996-04-01), Imai et al.
patent: 5520740 (1996-05-01), Kanai et al.
patent: 5536723 (1996-07-01), Kimoto et al.
patent: 5549802 (1996-08-01), Guo
patent: 5587039 (1996-12-01), Salimian et al.
patent: 5660640 (1997-08-01), Laube
patent: 5714010 (1998-02-01), Matsuyama et al.
patent: 5762748 (1998-06-01), Banholzer et al.
patent: 5808270 (1998-09-01), Marantz et al.
patent: 5840434 (1998-11-01), Kojima et al.
patent: 5853847 (1998-12-01), Takahashi
patent: 5858100 (1999-01-01), Maeda et al.
patent: 5879523 (1999-03-01), Wang et al.
patent: 5903428 (1999-05-01), Grimard et al.
patent: 5910338 (1999-06-01), Donde et al.
patent: 5916378 (1999-06-01), Bailey et al.
patent: 5916454 (1999-06-01), Richardson et al.
patent: 5939146 (1999-08-01), Lavernia
patent: 5953827 (1999-09-01), Or et al.
patent: 5967047 (1999-10-01), Agfa-Gevaert
patent: 5976327 (1999-11-01), Tanaka
patent: 6016465 (2000-01-01), Kholodenko et al.
patent: 6051114 (2000-04-01), Yao et al.
patent: 6059945 (2000-05-01), Fu et al.
patent: 6120621 (2000-09-01), Jin et al.
patent: 6120640 (2000-09-01), Shih et al.
patent: 6152071 (2000-11-01), Akiyama et al.
patent: 6306489 (2001-10-01), Hellmann et al.
patent: 6306498 (2001-10-01), Quarzglas
patent: 6338906 (2002-01-01), Ritland et al.
patent: 6379575 (2002-04-01), Yin et al.
patent: 6383459 (2002-05-01), Singh et al.
patent: 6394023 (2002-05-01), Crocker
patent: 6444083 (2002-09-01), Steger et al.
patent: 6454870 (2002-09-01), Brooks
patent: 6555471 (2003-04-01), Sandhu et al.
patent: 6565984 (2003-05-01), Wu et al.
patent: 6566161 (2003-05-01), Rosenberg et al.
patent: 6592830 (2003-07-01), Krupin et al.
patent: H2087 (2003-11-01), Balliett et al.
patent: 6777045 (2004-08-01), Lin et al.
patent: 6902627 (2005-06-01), Brueckner et al.
patent: 6902628 (2005-06-01), Wang et al.
patent: 6933025 (2005-08-01), Lin et al.
patent: 7026009 (2006-04-01), Lin et al.
patent: 2001/0033706 (2001-10-01), Shimomura et al.
patent: 2002/0086118 (2002-07-01), Chang et al.
patent: 2002/0090464 (2002-07-01), Mingwei et al.
patent: 2003/0026917 (2003-02-01), Lin et al.
patent: 2003/0047464 (2003-03-01), Sun et al.
patent: 2003/0108680 (2003-06-01), Gell et al.
patent: 2003/0116276 (2003-06-01), Weldon et al.
patent: 2003/0118731 (2003-06-01), He et al.
patent: 2003/0136428 (2003-07-01), Krogh
patent: 2003/0152503 (2003-08-01), DeVeau et al.
patent: 2003/0170486 (2003-09-01), Austin et al.
patent: 2003/0173526 (2003-09-01), Popiolkowski et al.
patent: 2003/0185965 (2003-10-01), Lin et al.
patent: 2003/0196890 (2003-10-01), Le et al.
patent: 2003/0221702 (2003-12-01), Peebles
patent: 2004/0045574 (2004-03-01), Tan
patent: 2004/0056211 (2004-03-01), Popiolkowski et al.
patent: 2004/0099285 (2004-05-01), Wang et al.
patent: 2004/0180158 (2004-09-01), Lin et al.
patent: 2005/0028838 (2005-02-01), Brueckner
patent: 2006/0105182 (2006-05-01), Brueckner et al.
patent: 2006/0110620 (2006-05-01), Lin et al.
patent: 19719133 (1998-11-01), None
patent: 0239349 (1992-07-01), None
patent: 0838838 (1998-04-01), None
patent: 0845545 (1998-06-01), None
patent: 1 049 133 (2000-11-01), None
patent: 1158072 (2001-11-01), None
patent: 1258908 (2002-11-01), None
patent: 2 562 097 (1985-10-01), None
patent: 54162696 (1979-12-01), None
patent: 54162969 (1979-12-01), None
patent: 11-59368 (1987-12-01), None
patent: 63235435 (1988-09-01), None
patent: 02-101157 (1990-04-01), None
patent: 03-138354 (1991-06-01), None
patent: 07-197272 (1995-08-01), None
patent: 09-272965 (1997-10-01), None
patent: 10-045461 (1998-02-01), None
patent: 63-149396 (1998-06-01), None
patent: 10-251871 (1998-09-01), None
patent: 10-330971 (1998-12-01), None
patent: 11-137440 (1999-05-01), None
patent: 11-220164 (1999-08-01), None
patent: 11229164 (1999-08-01), None
patent: 11-283972 (1999-10-01), None
patent: 2000-228398 (1999-10-01), None
patent: 2250990 (1999-10-01), None
patent: 11-345780 (1999-12-01), None
patent: 2000-072529 (2000-03-01), None
patent: 2000-191370 (2000-07-01), None
patent: 2002-069695 (2002-03-01), None
patent: 2002-069696 (2002-03-01), None
patent: 546680 (2003-08-01), None
patent: WO-98/50599 (1998-11-01), None
patent: WO-99/17336 (1999-04-01), None
patent: WO-0215255 (2002-02-01), None
patent: WO-03/083160 (2003-10-01), None
patent: WO-2006/073585 (2006-07-01), None
U.S. Patent Application entitled, “Fabricating and Cleaning Chamber Components Having Textured Surfaces”; filed Sep. 2, 2003; U.S. Appl. No. 10/653,713; Inventors: West, et al.
U.S. Appl. No. 60/304,091, filed Jul. 9, 2001, Gell et al.
U.S. Appl. No. 10/304,535, filed Nov. 25, 2002, Wang et al.
Rosenberg, R.W., “Increasing PVD Tool Uptime and Particule Control with Twin-Wire-Arc Spray Coatings,” Mar. 2001, pp. 103-105, 108, 111, vol. 19, No. 3, Cannon Comm., Santa Monica, California.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Electrochemical removal of tantalum-containing materials does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Electrochemical removal of tantalum-containing materials, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electrochemical removal of tantalum-containing materials will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2638830

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.