Electro-static discharge and latchup resistant semiconductor...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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Details

C257S343000, C257S375000, C257S376000, C257SE21379, C257SE21544, C257SE21696

Reexamination Certificate

active

07741680

ABSTRACT:
The present invention relates to a semiconductor device including a substrate layer, a metal-oxide-semiconductor field-effect transistor (MOSFET), a backgate region, an isolation layer and a diode. The MOSFET includes a gate region, a source region and a drain region. The source and drain regions are embedded in the backgate region, which includes a voltage input terminal. The isolation layer is located between the backgate region and the substrate layer and has a doping type opposite that of the backgate region. The diode includes a first terminal connected to the isolation layer and a second terminal coupled to an isolation voltage source.

REFERENCES:
patent: 4825275 (1989-04-01), Tomassetti
patent: 6160304 (2000-12-01), Ludikhuize
patent: 6600199 (2003-07-01), Voldman et al.
patent: 11-87692 (1999-03-01), None
patent: 2002015199 (2002-02-01), None
PCT International Search Report and Written Opinion for PCT/US2009/50524 mailed on Sep. 3, 2009.

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