Electrically floating shield in a plasma reactor

Details Electrically floating shield in a plasma reactor Electrically floating shield in a plasma reactor

1996-07-10

1998-04-07

Nguyen, Nam

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20419212, 20429806, 20429808, 20429814, C23C 1434

Patent

active

057360219

ABSTRACT:
In a plasma reactor, especially one intended for physical vapor deposition (PVD) onto semiconductor substrates, a shield disposed in front of the chamber walls between the PVD target and the substrates to protect the chamber walls. According to the invention, the shield is left electrically floating so that electrically charged ions and electrons emanating from the plasma or target and impinging upon the shield charge it to the point that the electrical flux is repelled.

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patent: 5538603 (1996-07-01), Guo

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