ECR CVD method for forming BN films

Details ECR CVD method for forming BN films ECR CVD method for forming BN films

1991-05-24

1994-01-11

King, Roy

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

427570, 427577, 427569, 427575, 4272552, 4272557, 427284, 427402, B05D 306

Patent

active

052779394

ABSTRACT:
A method of forming a boron nitride containing film on a substrate is disclosed. The method includes disposing a substrate in a reaction chamber, inputting a reactive gas comprising boron and nitrogen into the reaction chamber, exciting the reactive gas in the reaction chamber by applying a DC biased, RF electric field thereto in the presence of a magnetic field, and depositing the boron nitride containing film on the substrate.

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patent: 4732761 (1988-03-01), Machida et al.
patent: 4973494 (1990-11-01), Yamazaki

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