E-beam curable resist and process for e-beam curing the resist

Details E-beam curable resist and process for e-beam curing the resist E-beam curable resist and process for e-beam curing the resist

2006-01-24

2006-01-24

Hamilton, Cynthia (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S281100, C430S270100, C430S296000, C430S286100, C430S285100, C430S330000, C430S323000

Reexamination Certificate

active

06989227

ABSTRACT:
One embodiment of the present invention is a photoresist formulation that includes e-beam cross-linkable substituents, which substituents include one or more of the following functional groups: (a) carbon-carbon double bonds; (b) a strained ring system; (c) a halogenated compound; and (d) one or more organo-silicon moieties.

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