Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1998-01-27
2000-03-14
Chu, John S.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430905, 430909, 430910, 430942, 430325, 430326, 206455, G03F 7004
Patent
active
060370971
ABSTRACT:
The present invention relates to chemically amplified resists and resist systems wherein some of the polar functional groups of the aqueous base soluble polymer or copolymers are protected with a cyclic aliphatic ketal protecting group such as methoxycyclohexanyl. The resists and the resist systems of the present invention containing the new protecting group have improved shelf-life and vacuum stability as compared to the prior art resists. Thus, the resists of the present invention are highly useful in e-beam lithographic applications.
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Bucchignano James J.
Huang Wu-Song
Katnani Ahmad D.
Lee Kim Y.
Moreau Wayne M.
Capella, Esq. Steven
Chu John S.
International Business Machines - Corporation
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