Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Reexamination Certificate
2006-05-03
2009-12-15
Chu, John S (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
C430S270100, C430S926000
Reexamination Certificate
active
07632630
ABSTRACT:
The present invention provides new photoresist compositions that comprise a resin binder, a photoactive component, particularly an acid generator, and a dye material that contains one or more chromophores that can reduce undesired reflections of exposure radiation. Preferred dye compounds are polymeric materials that include one or more chromophores such as anthracene and other polycyclic moieties that effectively absorb deep UV exposure radiation.
REFERENCES:
patent: 4618566 (1986-10-01), Guillet et al.
patent: 5157091 (1992-10-01), Masataka et al.
patent: 6136498 (2000-10-01), Jagannathan et al.
Adams Timothy G.
Bell Rosemary
doCanto Manual
Miller-Fahey Robin L.
Mori James Michael
Chu John S
Corless Peter F.
Edwards Angell Palmer & & Dodge LLP
Frickey Darryl P.
Rohm and Haas Electronic Materials LLC
LandOfFree
Dyed photoresists and methods and articles of manufacture... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Dyed photoresists and methods and articles of manufacture..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Dyed photoresists and methods and articles of manufacture... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4089462