Dual substrate loadlock process equipment

Details Dual substrate loadlock process equipment Dual substrate loadlock process equipment

2011-07-12

2011-07-12

MacArthur, Sylvia R. (Department: 1716)

Coating apparatus

Gas or vapor deposition

With treating means

C156S345220, C062S259200

Reexamination Certificate

active

07976635

ABSTRACT:
One embodiment relates to a loadlock having a first support structure therein to support one unprocessed substrate and a second support structure therein to support one processed substrate. The first support structure is located above the second support structure. The loadlock includes an elevator to control the vertical position of the support structures. The loadlock also includes a first aperture to permit insertion of an unprocessed substrate into the loadlock and removal of a processed substrate from the loadlock, as well as a second aperture to permit removal of an unprocessed substrate from the loadlock and insertion of a processed substrate into the loadlock. A cooling plate is also located in the loadlock. The cooling plate includes a surface adapted to support a processed substrate thereon. A heating device may be located in the loadlock above the first support structure.

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