Dual port memory device with reduced coupling effect

Static information storage and retrieval – Read/write circuit – Having particular data buffer or latch

Reexamination Certificate

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C257SE27098, C257S369000

Reexamination Certificate

active

07577040

ABSTRACT:
A dual port SRAM cell includes at least one pair of cross-coupled inverters connected between a power line and complementary power line. A number of pass gate transistors connect the cross-coupled inverters to a first bit line, a first complementary bit line, a second bit line, and a second complementary bit line on a first metal layer in the memory device. A first word line is coupled to gates of the first and second pass gate transistors, located on a second metal layer in the memory device. A second word line is coupled to gates of the third and fourth pass gate transistors, located on a third metal layer in the memory device, wherein the first, second and third metal layers are at different levels.

REFERENCES:
patent: 5966317 (1999-10-01), O'Connor
patent: 6118708 (2000-09-01), Yoshida et al.
patent: 7092279 (2006-08-01), Sheppard
patent: 7365432 (2008-04-01), Liaw
patent: 2002/0100920 (2002-08-01), Yamauchi et al.
patent: 2005/0121810 (2005-06-01), Mali et al.
patent: 2005/0247981 (2005-11-01), Wang
patent: 2005/0253287 (2005-11-01), Liaw
patent: 2006/0291274 (2006-12-01), Uematsu
Koji Nil, et al., A 90nm Dual-Port SRAM with 2.04 μm28T-Thin Cell Using Dynamically-Controlled Column Bias Scheme, ISSCC 2004/Session 27/SRAM/27.9, 2004 IEEE Int'l Solid-State Circuits Conference.
Chinese Office Action 2007100846852.

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