Dual-oxide transistors for the improvement of reliability...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate

Reexamination Certificate

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C438S303000, C438S302000

Reexamination Certificate

active

06951792

ABSTRACT:
The invention provides a transistor having low leakage currents and methods of fabricating the transistor on a semiconductor substrate. The transistor has a gate and a nonuniform gate oxide under the gate.

REFERENCES:
patent: 3719866 (1973-03-01), Naber et al.
patent: 4935802 (1990-06-01), Noguchi et al.
patent: 5108939 (1992-04-01), Manley et al.
patent: 5420060 (1995-05-01), Gill et al.
patent: 5422505 (1995-06-01), Shirai
patent: 5451799 (1995-09-01), Kurimoto et al.
patent: 5926729 (1999-07-01), Tsai et al.
patent: 5948703 (1999-09-01), Shen et al.
patent: 5960289 (1999-09-01), Tsui et al.
patent: 6097061 (2000-08-01), Liu et al.
patent: 6124171 (2000-09-01), Arghavani et al.
patent: 6225659 (2001-05-01), Liu
patent: 6225669 (2001-05-01), Long et al.
patent: 6284580 (2001-09-01), Takehiro
patent: 6303521 (2001-10-01), Jenq
patent: 6462388 (2002-10-01), Perner
patent: 6706577 (2004-03-01), Twu et al.
patent: 6706581 (2004-03-01), Hou et al.
patent: 6716685 (2004-04-01), Lahaug
Fung, S., Chan, M., Ko, P., “Inverse-Narrow-Width Effect of Deep Sub-Micrometer Mosfets with Locos Isolation,” Received Oct. 8, 1996, Revised Mar. 17, 1997, Solid Sate Electronics, vol. 41, No. 12, pp. 1885-1889, 1997.
Wayne Wolf, “Modern VLSI Design, A System Approach,” PTR Prentice Hall, Englewood Cliffs, New Jersey 07632, p. 29.
Imamiya et al., “MP 6.6, A 130mm2256Mb NAND Flash with Shallow Trench Isolation Technology,” 1999 IEEE International Solid-State Circuits Conference, 0-7803-5129/99, IEEE 1999.

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