Dual mode hybrid control and method for CMP slurry

Details Dual mode hybrid control and method for CMP slurry Dual mode hybrid control and method for CMP slurry

2005-08-09

2005-08-09

Morgan, Eileen P. (Department: 3723)

Abrading

Precision device or process - or with condition responsive...

Computer controlled

C451S011000, C451S036000, C451S041000, C451S060000, C073S861000, C073S197000

Reexamination Certificate

active

06926584

ABSTRACT:
A DMHC (dual mode hybrid control) system and method which facilitates enhanced control in the delivery of polishing slurry to a CMP (chemical mechanical polishing) apparatus. The DMHC comprises a linear table and a PID (proportional integrated differential) controller operably connected to a slurry pump provided in a slurry flow conduit which delivers the polishing slurry to the CMP apparatus. A bubble trap and a flowmeter provided in the slurry flow conduit downstream of the slurry pump are operably connected to the PID controller, and the CMP apparatus is located downstream of the flowmeter.

REFERENCES:
patent: 3877287 (1975-04-01), Duntz, Jr.
patent: 3881990 (1975-05-01), Burton et al.
patent: 4767417 (1988-08-01), Boehringer et al.
patent: 4966691 (1990-10-01), Brous
patent: 5046925 (1991-09-01), Fletcher
patent: 5273664 (1993-12-01), Schulz

Affiliated with

Also associated with

Rating

Dual mode hybrid control and method for CMP slurry does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Dual mode hybrid control and method for CMP slurry, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Dual mode hybrid control and method for CMP slurry will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3523619