Dry process for the production of microelectronic devices

Details Dry process for the production of microelectronic devices Dry process for the production of microelectronic devices

1981-03-04

1982-09-07

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Electron beam imaging

430311, 430313, 430318, 430319, G03C 500

Patent

active

043484735

ABSTRACT:
A dry process for the manufacture of microelectronic devices from a work piece, which may be carried out entirely in a vacuum chamber, and which involves the coating of the work piece with a thin film of a monomer, selectively polymerizing the monomer according to a pattern of the microelectronic device desired, heating the layer of monomer to evaporate unpolymerized monomer to expose electronic circuit materials thereunder, removing the exposed electronic circuit materials, and stripping the polymerized monomer resist from the surface of the work piece.

REFERENCES:
patent: 3113896 (1963-12-01), Mann
patent: 3885076 (1975-05-01), Heidenreich et al.
patent: 3920454 (1975-11-01), Thompson
patent: 4080721 (1978-03-01), Hung
patent: 4102733 (1978-07-01), Delamoneda et al.
patent: 4114255 (1978-09-01), Salsbury et al.

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