Dry Lithographic Process

Details Dry Lithographic Process Dry Lithographic Process

1980-03-25

1981-08-11

Powell, William A.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Electron beam imaging

156643, 156646, 204192C, 204192E, 427 41, 427 431, 427259, 430328, G03C 500, B44C 122, C03C 1500, C03C 2506

Patent

active

042834821

ABSTRACT:
A plasma-polymerized film formed on the surface of a substrate is found to be suitable for subsequent use in electron-beam lithography and the film exposed to a beam of electrons is then developed to provide it with the predetermined pattern. These steps of plasma polymerization, electron-beam exposure and development can be consecutively carried out in vapor phase within a unified vacuum apparatus.

REFERENCES:
patent: 4187331 (1980-02-01), Ma
patent: 4201800 (1980-05-01), Alcorn et al.
patent: 4226896 (1980-10-01), Coburn
IBM Technical Disclosure Bulletin, vol. 21, No. 5, Oct. 1978, Simple Stripper of Charred Resist by J. Ahn et al., pp. 2111-2112.

Affiliated with

Also associated with

Rating

Dry Lithographic Process does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Dry Lithographic Process, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Dry Lithographic Process will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1026504