Dry etching method

Details Dry etching method Dry etching method

2005-04-05

2005-04-05

Coleman, W. David (Department: 2823)

Semiconductor device manufacturing: process

Chemical etching

Vapor phase etching

C438S730000

Reexamination Certificate

active

06875698

ABSTRACT:
In dry etching process wherein a substrate having a multi-layer film is etched, the etching process is monitored by determining a layer being processed. CHF3gas is added to the processing gas during a period from the time when the lowermost layer on the substrate is etched until the etching is completed.

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patent: 5952244 (1999-09-01), Abraham et al.
patent: 6097094 (2000-08-01), Ishigami

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