Dry etching method

Details Dry etching method Dry etching method

1995-06-01

1998-01-06

Dang, Thi

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

1566461, 1566621, H01L 2100

Patent

active

057050295

ABSTRACT:
Etching of an article is carried out by maintaining the article at a temperature at which the vapor pressure of etching gas molecules becomes equal to or higher than the pressure of etching gas and the vapor pressure of neutral radicals contained in a plasma becomes equal to or lower than the pressure of an etching gas. An etching pattern with a substantially vertical side profile and extremely small in dimensional shift from the mask can be formed at high precision.

REFERENCES:
patent: 4367114 (1983-01-01), Steinberg et al.
patent: 4383885 (1983-05-01), Maydan et al.
patent: 4468285 (1984-08-01), Bayman et al.
patent: 4490209 (1984-12-01), Hartman
patent: 4565601 (1986-01-01), Kakehi et al.
patent: 4615755 (1986-10-01), Tracy et al.

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