Dry etching method

Details Dry etching method Dry etching method

1988-07-25

1991-02-12

Simmons, David A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156646, 156656, 156657, 1566591, 156662, 156664, 156665, C03C 1500, C23F 100

Patent

active

049921363

ABSTRACT:
An article to be etched is contacted with a plasma of a mixed gas containing an etching gas and a film forming gas or a surface modification gas at a low temperature to effect the dry etching of the article, whereby the selectivity of etching can be made very high and the inclination angle of the side wall of pattern can be controlled at a desired level.

REFERENCES:
patent: 4264409 (1981-04-01), Forget et al.
patent: 4615764 (1986-10-01), Bobbio et al.
patent: 4666555 (1987-05-01), Tsang
patent: 4678540 (1987-07-01), Uchimura
patent: 4726879 (1988-02-01), Bondur et al.
patent: 4734157 (1988-03-01), Carbaugh et al.
patent: 4741799 (1988-05-01), Chen et al.

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