Dry etching gas and method for dry etching

Details Dry etching gas and method for dry etching Dry etching gas and method for dry etching

2011-04-26

2011-04-26

Olsen, Allan (Department: 1716)

Etching a substrate: processes

Gas phase etching of substrate

Application of energy to the gaseous etchant or to the...

C252S079100, C216S079000, C216S080000

Reexamination Certificate

active

07931820

ABSTRACT:
A dry etching gas that comprises a compound having a CF3CF fragment directly bonded to a double bond (provided that the compound is exclusive of CF3CF═CFCF═CF2). Said dry etching gas permits the formation of a pattern such as a contact hole with a high aspect ratio.

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