Dry development of photoresist

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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Details

156646, 156655, 156657, 1566591, 156628, 156662, 156668, 156904, 427 431, 430296, 430313, B44C 122, H01L 21306, C03C 1500, B29C 3700

Patent

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048820083

ABSTRACT:
A process for developing a photolithographic pattern on the surface of an exposed workpiece in a process chamber; disposing the workpiece in a process chamber; heating the workpiece and introducing a silylating agent to the process chamber and to a face of the workpiece to be processed; generating activated species from a source of oxygen; and introducing the activated species to the face of the workpiece.

REFERENCES:
patent: 4751170 (1988-06-01), Mimura et al.
patent: 4782008 (1988-11-01), Babich et al.

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