Dry-developed, negative working electron resist system

Details Dry-developed, negative working electron resist system Dry-developed, negative working electron resist system

1983-10-25

1985-02-05

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Electron beam imaging

430323, 430330, 430270, G03C 500

Patent

active

044978910

ABSTRACT:
A process for producing a resist pattern by dry development using a resist comprising from 70 to 50% by weight of a novolac resin and from 30 to 50% by weight of a poly(ether pentene sulfone).

REFERENCES:
patent: 4241165 (1980-12-01), Hughes et al.
patent: 4267257 (1981-05-01), Poliniak et al.
patent: 4289845 (1981-09-01), Bowden et al.
patent: 4307178 (1981-12-01), Kaplan et al.
patent: 4398001 (1983-08-01), Cheng et al.
patent: 4409317 (1983-10-01), Shiraishi
patent: 4476216 (1984-10-01), Tobias

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