Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent
1991-11-22
1994-06-21
McCamish, Marion E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
430270, 430313, G03C 172, G03F 700
Patent
active
053227654
ABSTRACT:
Dry developable top surface imageable photoresist compositions which comprise, in admixture, a film-forming aromatic polymer resin activated to electrophilic substitution, an acid catalyzable agent capable of being inserted into the aromatic polymer resin, and a radiation degradable acid generating compound and processes for generating positive tone resist images on substrates therewith.
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Reck et al., SPIE Regional Technical Conference on Photopolymers Ellenville, NY 63 (1988), "Novel Photoresist Design Based on Electrophilic Aromatic Substitution."
Schellekens et al.; Proc SPIE 1086, 220 (1989); "Single Level Dry Developable Resist Systems, Based on Gas Phase Silylation".
Clecak Nicholas J.
Conley Willard E.
Kwong Ranee W.-L.
Linehan Leo L.
MacDonald Scott A.
Ashton Rosemary
Crockatt Dale M.
International Business Machines - Corporation
McCamish Marion E.
Stemwedel John A.
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