Divergent charged particle implantation for improved...

Details Divergent charged particle implantation for improved... Divergent charged particle implantation for improved...

2008-05-05

2010-10-05

Vanore, David A (Department: 2881)

Radiant energy

With charged particle beam deflection or focussing

With detector

C250S398000, C250S492100, C250S492200, C250S492220

Reexamination Certificate

active

07807978

ABSTRACT:
The present invention provides a method for implanting charged particles in a substrate and a method for manufacturing an integrated circuit. The method for implanting charged particles in a substrate, among other steps, includes projecting a beam of charged particles (320) to a substrate (330), the beam of charged particles (320) having a given beam divergence; and forming a diverged beam of charged particles (360) by subjecting the beam of charged particles (320) to an energy field (350), thereby causing the beam of charged particles (320) to have a larger beam divergence. The method then desires implanting the diverged beam of charged particles (360) into the substrate (330).

REFERENCES:
patent: 6521897 (2003-02-01), Lindquist et al.
patent: 2002/0121889 (2002-09-01), Larsen et al.
patent: 2003/0001110 (2003-01-01), Enge et al.

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