Dissolution inhibitor of chemically amplified photoresist and ch

Details Dissolution inhibitor of chemically amplified photoresist and ch Dissolution inhibitor of chemically amplified photoresist and ch

1999-01-21

2000-12-26

Baxter, Janet

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

560 82, 430914, G03F 7004

Patent

active

061656801

ABSTRACT:
A dissolution inhibitor for use in a chemically amplified photoresist, and a chemically amplified photoresist composition containing the same are provided. The dissolution inhibitor is a compound in which an acid-labile di-alkylmalonate group is combined as a functional group with a C.sub.1 to C.sub.20 hydrocarbon. The chemically amplified photoresist composition containing the dissolution inhibitor has a high contrast and high thermal decomposition temperature, making it suitable for forming a fine pattern having excellent profile.

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Chemical Abstracts Registry File, Registry No. 2163-44-2.
Tohru Ushirogouchi et al.; "Dissolution Inhibitors for 193-NM Chemically Amplified Resists"; Jpn. J. Appl. Phys., Part 1 (1997), 36(12B), 7625-7631 Coden: JAPNDE; ISSN: 0021-4922 abstract only.
R Schwalm et al.; "Dissolution Inhibitors and Modulators for Chemical Amplification Resists"; J. Photopolym. Sci. Technol. (1990), 3(3), 347-354 Coden: JSTEEW Abstract only.

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