Di- and triphenyl monoterpene hydrocarbon derivatives, dissoluti

Details Di- and triphenyl monoterpene hydrocarbon derivatives, dissoluti Di- and triphenyl monoterpene hydrocarbon derivatives, dissoluti

1997-04-01

2000-02-29

Chu, John S.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430917, 568591, 568592, 568631, 568632, 568633, 568644, G03F 7004, C07C 4330

Patent

active

060307463

ABSTRACT:
Di- or triphenyl monoterpene hydrocarbon derivatives of formula (1) are novel. ##STR1## X is a di- or trivalent monoterpene hydrocarbon group, R.sup.1 to R.sup.3 are hydrogen or an alkyl, alkoxy, alkoxyalkyl, alkenyl or aryl group, R.sup.4 is hydrogen or an acid labile group, at least one R.sup.4 being an acid labile group, letter n is an integer of 1-5, j, k and m are integers of 0-4, n+j+k+m=5, and p is 2 or 3. When used as a dissolution rate regulator, the compound of formula (1) exerts remarkably enhanced dissolution inhibitory effect and minimized light absorption in the deep-UV region. A chemically amplified positive resist composition having the compound of formula (1) blended therein is highly sensitive to actinic radiation such as deep-UV radiation, electron beam and X-ray, especially KrF excimer laser light, and has improved sensitivity, resolution and plasma etching resistance.

REFERENCES:
patent: 5824451 (1998-10-01), Aoai et al.

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