Device manufacture involving lithographic processing

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Electron beam imaging

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430 4, 430 5, 430311, 430395, 430396, 430942, 355 71, 359738, 359888, 359894, B05D 512, B05D 306, B05D 304

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RE0369640

ABSTRACT:
Fabrication of devices of micron and submicron minimum feature size is accomplished by lithographic processing involving a back focal plane filter. A particularly important fabrication approach depends upon mask patterns which produce images based on discrimination as between scattered and unscattered radiation by accelerated electrons.

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