Device for the deposition of crystalline layers on...

Details Device for the deposition of crystalline layers on... Device for the deposition of crystalline layers on...

2005-06-14

2005-06-14

Alejandro-Mulero, Luz (Department: 1763)

Coating apparatus

Gas or vapor deposition

C156S345290, C156S345330

Reexamination Certificate

active

06905548

ABSTRACT:
The invention relates to a device for the deposition of in particular, crystalline layers on one or several, in particular, equally crystalline substrates, comprising a process chamber, arranged in a reactor housing, which may be charged with the substrates from above, by a reactor housing opening which may be sealed by a cover. The reactor housing opening opens out into a glove box, in particular flushed with highly pure gas and connects electricity, liquid or gas supply lines to the cover. According to the invention, the connection of supply lines for electricity, fluid or gas sources arranged outside the glove box to the cover of the reactor housing arranged within the glove box may be improved, whereby the electricity, fluid or gas supply lines run freely, from outside the glove box, through a flexible tube which is sealed atone end to a flange arrangement rigidly fixed to the cover and sealed at the other end to an opening in the glove box wall.

REFERENCES:
patent: 4842680 (1989-06-01), Davis et al.
patent: 5027464 (1991-07-01), Knowlton
patent: 5788777 (1998-08-01), Burk, Jr.
patent: 198 13 523 (1999-10-01), None
patent: 0524073 (1993-01-01), None
patent: WO 96/00314 (1996-01-01), None
patent: WO 02/18679 (2002-03-01), None

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