Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent
1993-09-16
1994-11-22
McCamish, Marion E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
430326, 430330, G03C 500
Patent
active
053668510
ABSTRACT:
The sensitivity and dry etching pattern control of chemically amplified resists used in the production of devices such as electronic devices is substantially enhanced while image quality is improved through use of a specific expedient. In particular, the resist material after coating on the device substrate, is treated, e.g., heated to sufficiently high temperatures, to remove a portion of the protective groups on the polymeric component of the resist. Generally, when removal up to approximately 90% of the protective groups for substituents such as t-butoxycarboxyl is effected through this procedure, sensitivities as good as 10 mJ/cm.sup.2 for an X-ray exposure (.lambda.=14.ANG.) have been achieved, and both the image quality and dry etching pattern control are improved.
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AT&T Bell Laboratories
Duda Kathleen
McCamish Marion E.
Schneider Bruce S.
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