Optics: measuring and testing – By light interference – For dimensional measurement
Reexamination Certificate
2007-11-27
2007-11-27
Toatley, Jr., Gregory J. (Department: 2877)
Optics: measuring and testing
By light interference
For dimensional measurement
C356S512000, C356S521000
Reexamination Certificate
active
11038519
ABSTRACT:
A device, a microlithography projection exposure system, and a method for the determination of imaging errors of an optical imaging system using a radiation-superposition measuring technique which operates with lateral phase offset, having an optical element arranged on the object side of the imaging system, having a first periodic structure on the object side with a predetermined periodicity direction, an optical element arranged on the image side of the imaging system, having a second periodic structure on the image side with a periodicity direction corresponding to the first periodic structure, and a detector to detect the superposition pattern of an image of the first periodic structure with the second periodic structure. The first and/or second periodic structure contains at least three periodic substructures, which are arranged offset relative to one another by a predetermined phase offset in the periodicity direction, and the detector has a plurality of detector elements, the number of which is matched to the number of substructures and/or which respectively have a number of detector surfaces adapted for a predetermined aberration determination. In addition or as an alternative, it is possible to operate with a Moiré technique which produces a fringe superposition pattern.
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Doering Gordon
Haidner Helmut
Wegmann Ulrich
Carl Zeiss SMT AG
Richey Scott M
Toatley , Jr. Gregory J.
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