Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Reexamination Certificate
2006-01-10
2006-01-10
Fourson, George (Department: 2823)
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
Having insulated gate
C438S396000, C438S672000
Reexamination Certificate
active
06984555
ABSTRACT:
A ferroelectric capacitor device and method for producing such a device comprises forming a substrate, and forming a contact plug passing through the substrate. An electrically insulating layer is formed on the substrate, and a first electrode is formed on the electrically insulating layer. A ferroelectric layer is formed on the first electrode and a second electrode is formed on the ferroelectric layer. The first electrode is then electrically connected to the plug through the electrically insulating layer.
REFERENCES:
patent: 5597756 (1997-01-01), Fazan et al.
patent: 5742472 (1998-04-01), Lee et al.
patent: 5793076 (1998-08-01), Fazan et al.
patent: 5990507 (1999-11-01), Mochizuki et al.
patent: 6165804 (2000-12-01), Fazan et al.
patent: 6175127 (2001-01-01), Hong
patent: 6235573 (2001-05-01), Lee et al.
patent: 6351005 (2002-02-01), Al-Shareef et al.
patent: 2002/0003249 (2002-01-01), Park
patent: 2002/0055191 (2002-05-01), Matsushita et al.
patent: 2003/0094639 (2003-05-01), Ozaki
patent: 2003/0129796 (2003-07-01), Bruchhaus et al.
patent: 2004/0166629 (2004-08-01), Hilliger et al.
patent: 101 31 626 (2003-01-01), None
patent: 2001060670 (2001-03-01), None
Estrada Michelle
Fish & Richardson P.C.
Fourson George
Infineon - Technologies AG
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