Optics: measuring and testing – By configuration comparison – With photosensitive film or plate
Patent
1998-12-03
2000-01-11
Font, Frank G.
Optics: measuring and testing
By configuration comparison
With photosensitive film or plate
356371, G01B 1106, G01B 1130
Patent
active
060142189
ABSTRACT:
A device for end-point monitoring used in the polishing of components, in particular semiconductor components. The device has a textile structure, which may be constructed as a cloth or a pad, and is used to accommodate a component that is to be monitored. The textile-like structure has a windowless construction. The textile structure may be disposed on a platen. Furthermore, a light source, preferably a laser, for emitting a monochromatic red light beam having a preferred wavelength of approximately 800 nm is provided. The red light beam is directed through the textile structure onto the component to be monitored. In addition, a detector is used to detect the red light beam reflected by the component to be monitored. The end-point monitoring may, for example, be carried out by interferometry. In addition, a corresponding method is also described.
REFERENCES:
patent: 4733080 (1988-03-01), Brunnschweiler et al.
patent: 5081796 (1992-01-01), Schultz
patent: 5433651 (1995-07-01), Lustig et al.
patent: 5838447 (1998-11-01), Hiyama et al.
patent: 5893796 (1999-04-01), Birang et al.
Bradl Stephan
Heitzsch Olaf
Font Frank G.
Greenberg Laurence A.
Lauchman Lay la G.
Lerner Herbert L.
Siemens Aktiengesellschaft
LandOfFree
Device and method for end-point monitoring used in the polishing does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Device and method for end-point monitoring used in the polishing, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Device and method for end-point monitoring used in the polishing will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1466512