Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Reexamination Certificate
2008-07-29
2008-07-29
Chen, Bret (Department: 1792)
Coating processes
Direct application of electrical, magnetic, wave, or...
Plasma
C427S575000, C118S7230MW, C118S7230ME, C118S7230AN
Reexamination Certificate
active
07404991
ABSTRACT:
A microwave is introduced into a process chamber through a waveguide (26) of the plasma process apparatus, thereby generating plasma. A reflection monitor (40) and an electric power monitor (42) monitor the electric power of a reflected wave reflected by the plasma that is generated in the process chamber. Moreover, an incidence monitor (36) and a frequency monitor (48) monitor the frequency of the microwave generated by a magnetron (24). An electric power supplied to the magnetron (24) is controlled based on the monitored electric power of the reflected wave and the monitored frequency. This method thus controls plasma density to a constant level.
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European Search Report issued by the European Patent Office on Apr. 5, 2007, for corresponding European Application No. 07000526.9-2208.
Goto Tetsuya
Hirayama Masaki
Ohmi Tadahiro
Sugawa Shigetoshi
Chen Bret
Finnegan Henderson Farabow Garrett & Dunner L.L.P.
Tokyo Electron Limited
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