Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent
1986-08-11
1987-12-08
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
430149, 430154, 430331, G03C 500, G03F 726
Patent
active
047118369
ABSTRACT:
Disclosed is an aqueous developing solution containing a quaternary ammonium hydroxide developing agent, and as an additive an effective amount of a select compound which is either 1,3,5-trihydroxy benzene, 4-methylesculetin or a novolak-type resin. The aqueous developing solution is particularly useful in developing an imagewise-exposed layer of a positive-working photoresist composition containing a novolak-type resin and a photosensitive agent. In such application, it has been found that the developing solution more effectively removes the exposed portions of the photoresist composition without leaving a residue of exposed photoresist composition at the interface of the edges of the unexposed portions of the photoresist composition and the oxidized silicon substrate.
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Bowers Jr. Charles L.
O'Day Thomas P.
Olin Hunt Specialty Products Inc.
Simons William A.
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