Development of positive photoresists using cyclic quaternary amm

Details Development of positive photoresists using cyclic quaternary amm Development of positive photoresists using cyclic quaternary amm

1985-11-12

1986-08-19

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430331, 430309, 430189, 430192, G03F 726

Patent

active

046069992

ABSTRACT:
A method of developing a positive photoresist layer which has been image-wise-exposed comprising contacting the layer with an alkaline developing composition to remove exposed areas of the layer, the developing composition comprising a solution containing a cyclic quaternary ammonium hydroxide developing agent in a sufficient concentration to remove exposed areas of the layer. The present invention also includes a developing composition for use in the method.

REFERENCES:
patent: 3887450 (1975-06-01), Gilano et al.
patent: 4239661 (1980-12-01), Muraoka et al.
patent: 4384037 (1983-05-01), Hosaka et al.
patent: 4411981 (1983-10-01), Minezaki
patent: 4423138 (1983-12-01), Guild
patent: 4464461 (1984-08-01), Guild
Guild, Research Disclosure, No. 186, 10/1979, pp. 575-576.
DiFazio, IBM Tech. Discl. Bulletin, vol. 16, No. 2, 7/1973, p. 486.

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